Témakiírások
Development of a surface enhanced Raman spectroscopy (SERS) imaging platform and data processing algorithms for sensing purposes
témakiírás címe
Development of a surface enhanced Raman spectroscopy (SERS) imaging platform and data processing algorithms for sensing purposes
doktori iskola
témakiíró
tudományág
témakiírás leírása
Surface-enhanced Raman scattering (SERS) is an ultrasensitive spectroscopic method that provides specific vibrational fingerprint information of analytes. According to the widely accepted electrochemical enhancement mechanism, SERS enhancement can reach multiple orders of magnitude in the intense plasmon near-field around excited metallic nanoparticles. The field intensity and the spectral position of the localized surface plasmon resonance (LSPR) absorption peak (that should match the Raman excitation/emission wavelength) are strongly dependent on the geometrical properties of the nanoparticle arrangements (e.g., particle shape, size, and interparticle distance). For different Raman excitation wavelengths, these respective parameters should be optimized in order to maximize the achievable SERS enhancement.
In the past decade the Nanotechnology and Sensors Research Group of the Department of Electronics Technology (ETT) has been working together with the Nanostructures and Applied Spectroscopy Research Group at the Institute for Solid State Physics and Optics, HUN-REN Wigner Research Centre for Physics and with international partners on the fabrication and optimization of novel nanoparticle systems that maximize the SERS enhancement factor through control of the nanoparticles’ geometrical parameters. With one such technology, namely combinatorial thin-film deposition and subsequent annealing (developed at the Photonics Department of HUN-REN Institute of Technical Physics and Materials Science) it is possible to produce nanoparticle arrangements with a large variety of controlled geometrical parameters on a single sensing area. By developing an imaging SERS spectroscopy platform, the optimization of a vast technological parameter space can be significantly simplified experimentally.
The PhD work will focus on the development of 1) a Raman imaging measurement platform, capable of simultaneous spectral acquisition and evaluation of SERS enhancement with spatial resolution over the sensing area; 2) algorithms for processing and evaluating imaging Raman spectroscopy data; 3) optimization of nanofabrication technologies – based on the experimental results – to maximize SERS enhancement for various sensing applications (e.g. nucleotide sensing scenarios).
In the past decade the Nanotechnology and Sensors Research Group of the Department of Electronics Technology (ETT) has been working together with the Nanostructures and Applied Spectroscopy Research Group at the Institute for Solid State Physics and Optics, HUN-REN Wigner Research Centre for Physics and with international partners on the fabrication and optimization of novel nanoparticle systems that maximize the SERS enhancement factor through control of the nanoparticles’ geometrical parameters. With one such technology, namely combinatorial thin-film deposition and subsequent annealing (developed at the Photonics Department of HUN-REN Institute of Technical Physics and Materials Science) it is possible to produce nanoparticle arrangements with a large variety of controlled geometrical parameters on a single sensing area. By developing an imaging SERS spectroscopy platform, the optimization of a vast technological parameter space can be significantly simplified experimentally.
The PhD work will focus on the development of 1) a Raman imaging measurement platform, capable of simultaneous spectral acquisition and evaluation of SERS enhancement with spatial resolution over the sensing area; 2) algorithms for processing and evaluating imaging Raman spectroscopy data; 3) optimization of nanofabrication technologies – based on the experimental results – to maximize SERS enhancement for various sensing applications (e.g. nucleotide sensing scenarios).
felvehető hallgatók száma
1 fő
helyszín
ETT
jelentkezési határidő
2026-01-15