Thesis supervisor: Zoltán Hórvölgyi
Location of studies (in Hungarian): BME Department of Physical Chemistry and Materials Science Abbreviation of location of studies: BME
Description of the research topic:
Precise sub nanometer control of thin layers in the semiconductor industry is becoming more and more crucial for high-end devices. However, these thin layers can be contaminated by molecular impurities (even with monomolecular layers) that are circulating in the air. A key issue is the removal of these unwanted coatings during process steps while preserving semiconductor integrity. This study aims to optimize existing methods, such as high-temperature treatments and UV laser desorption processes, with a unique emphasis on integrating advanced ellipsometric techniques for real-time monitoring. Ellipsometry is a very powerful optical metrology technique to characterize thin layer variations in such a domain. The core of the research will include exploring various parameters for optimization such as temperature, treatment duration, pulse time, energy, and wavelength. Collaborations with industry leaders, particularly Semilab, a leading provider of optical and electrical metrology tools, provide unique access to resources, validating research findings for industrial integration. Apply for this PhD study if you want to be part of a dynamic interdisciplinary research environment that bridges materials science,
chemistry, physics, and engineering.
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